Ion implantation is an indispensable technological means of surface modification in manufacture of large scale integrated circuits. The ionization chamber of ion implantation requires very high temperature performance and chemical corrosion resistance, so most parts are made of tungsten, molybdenum, and tantalum materials.

High purity, fine grain, precise processing, are the basic requirements for ion implantation parts, we provide ion implantation chamber, filament, arc seam, fixture, and cathode parts.

Products: ion implantation chamber, filament, arc seam, fixture and cathode parts.